Company Filing History:
Years Active: 1990
Title: Richard N. Kniseley: Innovator in Thin Film Coating Technology
Introduction
Richard N. Kniseley is a notable inventor based in Ames, Iowa. He has made significant contributions to the field of thin film coating processes, particularly through his innovative use of inductively coupled plasma technology. His work has implications for various industries, including electronics and materials science.
Latest Patents
Richard N. Kniseley holds a patent for a "Thin film coating process using an inductively coupled plasma." This patent describes a method for applying thin coatings of normally solid materials to target substrates. The process involves vaporizing particles of the coating material through plasma heating, which then pass through an orifice into a vacuum zone. In this zone, the particles are accelerated to velocities greater than Mach 1, creating a shock wave that is intercepted by a skimmer cone. The particles then enter a second vacuum zone, where they impinge on the target substrate to form ultrapure coatings.
Career Highlights
Richard N. Kniseley is affiliated with the Iowa State University Research Foundation, Inc., where he continues to advance his research in thin film technologies. His work has garnered attention for its potential applications in various high-tech fields.
Collaborations
Throughout his career, Richard has collaborated with notable colleagues, including Frederick A. Schmidt and Brian D. Merkle. These collaborations have contributed to the development and refinement of his innovative coating processes.
Conclusion
Richard N. Kniseley's contributions to thin film coating technology exemplify the impact of innovative research in advancing industrial applications. His work continues to influence the field and inspire future developments in material science.