Location History:
- Great Eversden, GB (2012)
- Cambridge, GB (2013)
Company Filing History:
Years Active: 2012-2013
Title: Richard Martin Broad: Innovator in Seamless Modeling Technology
Introduction
Richard Martin Broad is a notable inventor based in Cambridge, GB. He has made significant contributions to the field of seamless modeling technology, holding a total of 2 patents. His innovative approaches have paved the way for advancements in manufacturing processes.
Latest Patents
Broad's latest patents focus on a seamless model and the method of making such a model. The first patent describes a seamless model free of bond lines, created through a method that involves providing a substructure with an exposed outer surface. The process includes applying a modeling paste in a continuous layer, curing this layer, and machining it to achieve the desired contour. The modeling paste is a mechanically frothed syntactic foam, which is prepared by injecting inert gas into a froth-forming composition, typically polyurethane or epoxy, containing microballoons. The second patent reiterates this innovative method, emphasizing the use of specific components in the polyurethane and epoxy compositions to enhance the properties of the modeling paste.
Career Highlights
Throughout his career, Richard Martin Broad has worked with prominent companies such as Huntsman Advanced Materials Americas LLC and Huntsman Advanced Materials LLC. His experience in these organizations has contributed to his expertise in materials science and modeling technologies.
Collaborations
Broad has collaborated with notable professionals in his field, including Mahesh Kotnis and Elizabeth Louise Otloski. These collaborations have further enriched his work and expanded the impact of his inventions.
Conclusion
Richard Martin Broad's contributions to seamless modeling technology demonstrate his innovative spirit and commitment to advancing manufacturing processes. His patents reflect a deep understanding of materials and methods that can revolutionize the industry.