Company Filing History:
Years Active: 1992
Title: The Innovative Contributions of Richard M. Wallach in Semiconductor Technology
Introduction
Richard M. Wallach is a notable inventor based in Guerneville, California, recognized for his significant contributions to the field of semiconductor technology. With one patented innovation, his work has added considerable value to the industry, particularly in the area of infrared detector arrays.
Latest Patents
Wallach’s patent, titled "Photo-anodic oxide surface passivation for semiconductors," presents an advanced method for passivating infrared detector arrays. This innovative technique involves subjecting a wafer of indium antimonide (InSb) to an anodization process while being illuminated by a bright incandescent lamp. The resulting photo-anodized layer is effectively used in arrays to passivate implanted diode regions on the front side while featuring an antireflective coating on the backside anodized surface.
Career Highlights
Richard M. Wallach has been an integral part of the Santa Barbara Research Center, where he has been instrumental in advancing semiconductor technologies. His expertise and innovative mindset have helped the organization drive research and development efforts that meet the evolving needs of the industry.
Collaborations
During his tenure at the Santa Barbara Research Center, Wallach collaborated with talented individuals like Ichiro Kasai and Bonnie A. Baumgratz. These collaborations have facilitated the exchange of innovative ideas, leading to enhanced research outcomes and the development of effective solutions in the field.
Conclusion
In summary, Richard M. Wallach’s contributions to semiconductor technology, particularly through his patent on photo-anodic oxide surface passivation, underscore his role as an influential inventor. His work not only reflects his innovative spirit but also his commitment to advancing technological solutions in the semiconductor industry.