Richard L Bersin

Title: Richard L. Bersin: Innovator in Plasma Ashing Technology

Introduction

Richard L. Bersin is a notable inventor based in Chigasaki, Japan. He has made significant contributions to the field of plasma technology, particularly with his innovative designs and applications. His work has been recognized for its impact on various industrial processes.

Latest Patents

Richard L. Bersin holds a patent for a Plasma Ashing Apparatus. This apparatus features a vacuum treatment chamber designed to receive a substrate coated with a resist film. It includes a reactive gas introduction pipe equipped with a plasma applicator, a vacuum exhaust pipe, and a heating mechanism for the substrate. The design incorporates two electrodes arranged in parallel, with one serving as the substrate electrode and the other as a circular counter electrode. These electrodes are connected to an RF power source, forming a cathode electrode. The counter electrode is uniquely designed with multiple concentric perforations, enhancing its functionality in plasma ashing processes.

Career Highlights

Richard L. Bersin has been associated with Nihon Shinku Gijutsu Kabushiki Kaisha, where he has contributed to advancements in plasma technology. His expertise in this area has led to the development of innovative solutions that improve efficiency and effectiveness in various applications.

Collaborations

Throughout his career, Richard has collaborated with esteemed colleagues such as Masashi Kikuchi and Masaki Uematsu. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Richard L. Bersin's contributions to plasma technology through his patent for a Plasma Ashing Apparatus exemplify his innovative spirit and dedication to advancing industrial processes. His work continues to influence the field and inspire future innovations.