Location History:
- Queen Creek, AZ (US) (2004)
- Dundee, MI (US) (2004)
Company Filing History:
Years Active: 2004
Title: The Innovative Contributions of Richard J Jenkins in Semiconductor Processing
Introduction
Richard J Jenkins, an esteemed inventor located in Queen Creek, AZ, has made significant strides in the semiconductor industry through his innovative work. With two patents to his name, Jenkins has contributed to the advancement of chemical mechanical polishing (CMP) processes critical for the production of semiconductor wafers.
Latest Patents
Jenkins' latest patents showcase his expertise in developing more efficient CMP processes. The first patent focuses on a continuous chemical mechanical polishing process for polishing multiple conductive and non-conductive layers on semiconductor wafers. This continuous CMP method involves a series of steps, including placing a substrate on a platen, utilizing mechanical and chemical means to polish the first layer, and adjusting parameters to efficiently polish additional layers.
His second patent introduces a novel CMP slurry composition used specifically for polishing metals. This inventive slurry comprises a dispersion solution containing an abrasive and an oxidizer, resulting in a high particle count while maintaining efficiency. Furthermore, the formulation includes a chemical activity enhancer and a corrosion inhibitor, which optimizes the copper removal rate without adversely affecting static etch rates.
Career Highlights
Throughout his career, Richard J Jenkins has made substantial contributions to semiconductor manufacturing processes. His role at Planar Solutions, LLC, allows him to apply his expertise in chemical mechanical polishing, enhancing the precision of semiconductor wafer fabrication. His dedication to innovation is evident in his pursuit of patents that address industry challenges, driving technological advancements in the field.
Collaborations
Jenkins collaborates with talented individuals such as Deepak Mahulikar and Anthony M Pasqualoni. Their combined efforts at Planar Solutions, LLC have further propelled advancements in CMP technologies, emphasizing teamwork and innovation within the organization.
Conclusion
In conclusion, Richard J Jenkins stands out as a significant figure in the semiconductor industry, having developed innovative processes that enhance the efficiency of wafer manufacturing. His contributions demonstrate the importance of continuous innovation in advancing technology, solidifying his reputation as a pioneer in the field of chemical mechanical polishing.