Windsor, CO, United States of America

Richard E Nethery



 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2015-2018

Loading Chart...
Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: Richard E Nethery: Innovator in Ion Source Technology

Introduction

Richard E Nethery is a notable inventor based in Windsor, CO (US). He has made significant contributions to the field of ion source technology, holding 2 patents that showcase his innovative approach to engineering.

Latest Patents

One of his latest patents is an "End-hall ion source with enhanced radiation cooling." This invention features an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-field generating means located in the permeable path between the two pole pieces. The design includes a thermally conductive cup that encloses the anode and reflector without contact, allowing a cooling fluid to flow through internal passages. The closed end of the cup is positioned between the reflector and the internal pole piece, while the opposite end is in direct contact with the external pole piece. The cup is constructed from materials with low microhardness, such as copper or aluminum.

Career Highlights

Richard E Nethery is associated with Kaufman & Robinson, Inc., where he continues to develop and refine his inventions. His work has significantly impacted the field of ion sources, enhancing their efficiency and performance.

Collaborations

Throughout his career, Richard has collaborated with notable colleagues, including Harold R Kaufman and James R Kahn. These partnerships have fostered innovation and contributed to the advancement of technology in their field.

Conclusion

Richard E Nethery stands out as a prominent inventor in ion source technology, with a focus on enhancing performance through innovative designs. His contributions continue to influence the industry and inspire future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…