Fremont, CA, United States of America

Richard E Graves


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 41(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Richard E. Graves

Introduction

Richard E. Graves is a notable inventor based in Fremont, California. He has made significant contributions to the field of lithography, particularly through his innovative patent related to E-beam lithography. His work has implications for enhancing the resolution of feature widths in lithographic systems.

Latest Patents

Graves holds a patent for a technique titled "Virtual addressing for E-beam lithography." This technique is performed in a fixed address particle beam lithographic system, where writing is executed in a conventional manner for creating patterns. The method involves writing an additional row of alternate pixels either before or after the selected feature is written. This approach results in a feature width that is approximately 1/2 a pixel wider than the selected width due to the blurring of the latent image caused by scattering within the resist. The technique enhances the resolution of selectable feature widths with minimal loss of throughput. It can also be utilized to lengthen a feature by 1/2 a pixel width. The invention is primarily disclosed in a raster scan machine, but it is also applicable in a vector scan machine.

Career Highlights

Richard E. Graves is associated with The Perkin-Elmer Corporation, where he has contributed to advancements in lithographic technology. His work has been instrumental in improving the efficiency and effectiveness of particle beam lithography systems.

Collaborations

Graves has collaborated with notable coworkers, including Charles S. Biechler and Allen M. Carroll. Their combined expertise has likely contributed to the successful development and implementation of innovative techniques in their field.

Conclusion

Richard E. Graves is a distinguished inventor whose work in E-beam lithography has significantly advanced the technology. His patent demonstrates a creative approach to enhancing resolution in lithographic systems, showcasing his valuable contributions to the field.

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