Richard De Geus

Title: Innovations by Richard De Geus in Chemical Mechanical Polishing

Introduction

Richard De Geus is a prominent inventor based in Cupertino, California, recognized for his significant contributions to the field of chemical mechanical polishing (CMP) technology. With a total of five patents to his name, he has made considerable advances in improving the methods of polishing semiconductor wafers, ensuring higher precision and efficiency in the process.

Latest Patents

Among Richard De Geus's latest innovations are two noteworthy patents related to apparatuses for chemical mechanical polishing. The first patent describes a method and apparatus that polishes the face of a semiconductor wafer using a tooling head to hold the wafer in position. This system employs an abrasive pad that moves parallel to the wafer's face. A sophisticated controller manages the motion of the table, enabling a predetermined polishing pattern while maintaining a constant velocity between the wafer and the abrasive pad. Another key feature is the tooling head, which includes a circular platen and a retention ring to handle lateral forces during polishing. An adjustable coupling facilitates precise positioning of the retaining ring relative to the wafer's face.

The second patent also details an innovative apparatus designed for polishing wafers, preferably through chemical mechanical polishing. This device incorporates a planar polishing surface coupled with a wafer carrier assembly that ensures the wafer remains stationary even when moved in circular or orbital paths. This setup allows for versatile polishing by permitting relative movement between the wafer carrier and the polishing surface.

Career Highlights

Richard De Geus has worked with esteemed companies in the semiconductor industry, notably Obsidian and Applied Materials, Inc. These positions have allowed him to hone his expertise in polishing technologies and significantly advance the capabilities of wafer fabrication processes.

Collaborations

Throughout his career, De Geus has had the pleasure of collaborating with talented professionals like Jon A. Hoshizaki and Roger O. Williams. Together, they have contributed to numerous projects aimed at enhancing semiconductor manufacturing techniques, further solidifying their place in the innovation landscape.

Conclusion

Richard De Geus's work in chemical mechanical polishing has not only advanced industry standards but has also paved the way for future innovations in semiconductor manufacturing. His patents reflect a deep commitment to improving the reliability and effectiveness of wafer polishing processes, making him a notable figure in the realm of inventions and innovations.