Richard A Borel

Title: The Innovative Contributions of Richard A. Borel

Introduction

Richard A. Borel is a notable inventor based in Garland, Texas. He has made significant contributions to the field of semiconductor processing through his innovative patent. His work focuses on enhancing the efficiency of plasma afterglow techniques, which are crucial for the semiconductor industry.

Latest Patents

Richard A. Borel holds a patent for a "Microwave apparatus for generating plasma afterglows." This invention is designed for stripping and etching photoresist and semiconductor materials at a high rate, enabling single wafer processing in fully automated reactors. The apparatus features a stripping and etching chamber that utilizes plasma afterglow for effective photoresist stripping and selective isotropic etching of materials like polysilicon and silicon nitride. It employs various etchant compositions that generate reactive species in a plasma. Additionally, the apparatus can perform anisotropic etching by decoupling etchant generation from ion production and acceleration, utilizing two plasma sources: microwave power and radio frequency (RF) power.

Career Highlights

Richard A. Borel is associated with Machine Technology, Inc., where he applies his expertise in microwave technology and plasma processing. His innovative approach has contributed to advancements in semiconductor manufacturing processes.

Collaborations

Richard has collaborated with notable colleagues, including John E. Spencer and Kenneth E. Linxwiler. Their combined efforts have furthered the development of technologies in the semiconductor field.

Conclusion

Richard A. Borel's contributions to the field of semiconductor processing through his innovative patent demonstrate his commitment to advancing technology. His work continues to impact the efficiency of manufacturing processes in the industry.