Richard A Anundson

Title: Innovations of Richard A. Anundson in Semiconductor Processing

Introduction

Richard A. Anundson is a notable inventor based in Austin, TX, who has made significant contributions to the field of semiconductor processing. His innovative work has led to the development of a unique multi-port gas injector, which plays a crucial role in enhancing the efficiency of chemical vapor deposition processes.

Latest Patents

Richard A. Anundson holds a patent for a "Multi-port gas injector for a vertical furnace used in semiconductor processing." This invention is designed for low-pressure chemical vapor deposition of silicon dioxide using a tetraethyl orthosilicate (TEOS) source. The multi-port gas injector features two or three ports for introducing TEOS into the vertical furnace. It consists of a first and second section of tubing, preferably made of quartz, which are joined at a substantially perpendicular angle. One end of the second section forms one of the ports, while a hole at the junction of the two sections can create a second port. In some embodiments, additional sections of tubing can be added to form more ports. The design also includes tapers in the second section of tubing to reduce the diameter of the gas exit hole.

Career Highlights

Richard A. Anundson is associated with Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work at AMD has allowed him to focus on innovative solutions that improve semiconductor manufacturing processes.

Collaborations

Richard has collaborated with notable colleagues, including Michael B. Allen and William A. Whigham, who have contributed to his projects and innovations in the field.

Conclusion

Richard A. Anundson's contributions to semiconductor processing through his innovative gas injector patent exemplify the importance of creativity and engineering in technology advancement. His work continues to influence the industry and improve manufacturing techniques.