Company Filing History:
1 out of 832,761 Years Active: 1994
Title: Reinhold Hirtz: Innovator in Epitaxial Structures
Introduction
Reinhold Hirtz is a notable inventor based in Huntington, NY (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to epitaxial structures.
Latest Patents
Hirtz holds a patent for a "Method for fabricating a multilayer epitaxial structure." This invention employs an all epitaxial process performed entirely in a CVD reactor. It allows for the growth of heavily doped layers on lightly doped layers on a heavily doped substrate, eliminating the need for separate diffusion, even for high impurity concentrations. The process begins with a heavily doped silicon substrate, typically having a carrier concentration greater than 1×10^19 per cm^3. To minimize outdiffusion, the substrate is capped by growing very thin and heavily doped silicon layers, which are depleted by hydrogen purges. A first epitaxial layer is then grown over the capped substrate, which is relatively lightly doped, having a resistivity of more than 200 ohm.cm. Subsequently, a second epitaxial layer is grown over the first, possessing a polarity opposite to that of the substrate and heavily doped to a resistivity of less than 0.005 ohm cm. Hirtz's innovative approach has the potential to enhance the efficiency and performance of semiconductor devices.
Career Highlights
Throughout his career, Reinhold Hirtz has focused on advancing semiconductor fabrication techniques. His work has contributed to the development of more efficient and effective methods for creating multilayer structures, which are essential in modern electronics.
Collaborations
Hirtz has collaborated with notable professionals in the field, including Gregory Zakaluk and Joseph Y Chan. These collaborations have likely enriched his research and development efforts, leading to innovative solutions in semiconductor technology.
Conclusion
Reinhold Hirtz's contributions to the field of epitaxial structures through his patent demonstrate his innovative spirit and commitment to advancing semiconductor technology. His work continues to influence the industry and pave the way for future advancements.