Fremont, CA, United States of America

Raymond W Lu


Average Co-Inventor Count = 7.9

ph-index = 1

Forward Citations = 123(Granted Patents)


Company Filing History:


Years Active: 2017-2025

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2 patents (USPTO):Explore Patents

Title: **Innovator Spotlight: Raymond W. Lu**

Introduction

Raymond W. Lu, based in Fremont, California, is an accomplished inventor with a notable portfolio of two patents. His contributions primarily focus on advancements in semiconductor processing technology, which play a crucial role in the development and efficiency of electronic devices. Through his work, he continues to make significant impacts on the industry and pave the way for future innovations.

Latest Patents

Raymond W. Lu is credited with two recent patents that showcase his expertise in semiconductor processing. The first patent, titled **"Semiconductor Processing Chamber for Improved Precursor Flow,"** introduces exemplary systems that incorporate a processing chamber along with a remote plasma unit. This design includes an adapter with both a central channel and a transition to maintain fluid isolation, improving the overall efficacy of semiconductor processing.

The second patent, titled **"Grooved Insulator to Reduce Leakage Current,"** focuses on enhancing the performance of plasma sources. It describes an innovative insulator configuration with grooves that prevent material deposition, which can adversely affect performance. The patent outlines a method for generating plasma with the inclusion of RF energy across electrodes, demonstrating Lu's commitment to solving complex challenges in semiconductor technology.

Career Highlights

Raymond W. Lu works at Applied Materials, Inc., a company renowned for its cutting-edge technologies in materials engineering. His role contributes to the development of innovative equipment and processes that are pivotal to the semiconductor manufacturing industry. Lu's background and work at Applied Materials have positioned him as a significant player in advancing semiconductor technologies.

Collaborations

Throughout his career, Raymond has collaborated with esteemed colleagues such as Tien Fak Tan and Soonam Park. These partnerships highlight the collaborative spirit of innovation within the field, facilitating the exchange of ideas and driving progress in semiconductor advancements.

Conclusion

Raymond W. Lu's inventive spirit and dedication to improving semiconductor processes make him a noteworthy figure in the realm of technology. With his two patents, he not only exemplifies innovation but also enhances the efficiency and effectiveness of semiconductor manufacturing. His contributions are set to influence the future of the industry, reflecting the important role of inventors in shaping technological landscapes.

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