Company Filing History:
Years Active: 2004
Title: The Innovative Contributions of Raymond Reuven Boxman
Introduction
Raymond Reuven Boxman is a notable inventor based in Herzelia, Israel. He is recognized for his significant contributions to the field of plasma technology. His innovative work has led to the development of advanced systems that enhance manufacturing processes.
Latest Patents
Raymond Reuven Boxman holds a patent for a vacuum arc plasma gun deposition system. This system includes a cathode and several anode assemblies that define a plasma channel. It features a current source that facilitates electrical current flow from the anode assemblies to the cathode. Additionally, the system incorporates mechanisms for moving the anode axially to maintain the active surface of the cathode at a fixed position relative to the anode assemblies. It also includes mechanisms for cooling the cathode and ensuring uniform coating on non-flat substrates. The scope of this invention encompasses methods for producing coated products by depositing coatings on substrates using this advanced system.
Career Highlights
Raymond Reuven Boxman is associated with Transarc Ltd., where he applies his expertise in plasma technology. His work at the company has been instrumental in advancing the capabilities of plasma deposition systems. His innovative approach has contributed to the development of new methods and products in the industry.
Collaborations
Raymond has collaborated with several professionals in his field, including Samuel Goldsmith and Yair David. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Raymond Reuven Boxman is a distinguished inventor whose work in vacuum arc plasma technology has made a significant impact on manufacturing processes. His contributions continue to influence advancements in the field, showcasing the importance of innovation in technology.