Alexandria, VA, United States of America

Raymond L Van Hoven

This inventor holds 1 USPTO granted patent. Top assignee: Research, Incorporated. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raymond L Van Hoven. Retrieved from https://idiyas.com/inventor/raymond-l-van-hoven

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 32(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Raymond L. Van Hoven

Introduction

Raymond L. Van Hoven is an American inventor based in Alexandria, VA, known for his innovative work in the field of plasma technology. With a keen focus on improving efficiency and functionality, he has made a significant mark through his patent for an inductively coupled helium plasma torch.

Latest Patents

Mr. Van Hoven holds one notable patent for his invention of an inductively coupled helium plasma torch. This device features a base member, a plasma tube, and a threaded insert member within the plasma tube, designed to direct the plasma gas in a tangential flow pattern. A standout aspect of this torch is its design, which eliminates the necessity for a separate coolant gas tube. The invention allows for easy assembly and disassembly with high alignment accuracy, demonstrating Van Hoven's commitment to user-friendly engineering.

Career Highlights

Raymond works at Research Incorporated, a firm that specializes in advanced technological innovations. His work encompasses not only the creation of his plasma torch but also broader explorations within plasma applications. His contributions have played a vital role in advancing research initiatives at his workplace, showcasing his innovative spirit.

Collaborations

In his endeavors, Mr. Van Hoven has collaborated with fellow professionals Akbar Montaser and Shi-Kit Chan. Their collective expertise and teamwork have greatly enhanced the research environment, fostering a culture of innovation and exploration in technologies that could reshape various industries.

Conclusion

Overall, Raymond L. Van Hoven's contributions to the field of plasma technology, exemplified by his patent for the inductively coupled helium plasma torch, highlight his role as an influential inventor. Through his collaborations and commitment to innovation, he continues to impact the landscape of technological advancements in meaningful ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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