South Burlington, VT, United States of America

Raymond E Rochefort


Average Co-Inventor Count = 10.0

ph-index = 4

Forward Citations = 106(Granted Patents)


Company Filing History:


Years Active: 2000-2001

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4 patents (USPTO):Explore Patents

Title: Innovations by Raymond E Rochefort in Photomask Repair

Introduction

Raymond E Rochefort is a notable inventor based in South Burlington, VT (US). He has made significant contributions to the field of photomask repair, holding a total of 4 patents. His work focuses on innovative methods that enhance the durability and functionality of photomasks used in various applications.

Latest Patents

One of his latest patents involves methods for the repair of photomasks. This method includes providing a coating on the mask to prevent damage to clear regions from laser ablation splatter, quartz pitting, laser deposition staining, and gallium staining caused by focused ion beam (FIB) processes. The coating can be made from metal, polymer, or carbon materials and is applied to both clear regions and areas over or under the light-absorbing material of the mask. A thin copper layer significantly improves imaging with the ion beam while protecting clear regions from FIB stains. Additionally, a photosensitive polymer is utilized to etch opaque defects, with subsequent repairs made in a FIB deposition step. In another embodiment, opaque defects can be repaired using a short pulse duration laser without damaging the underlying quartz or adjacent clear regions, thus eliminating the need for a coating.

Career Highlights

Raymond E Rochefort is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of photomask technology. His expertise and contributions have positioned him as a key figure in his area of specialization.

Collaborations

Throughout his career, Rochefort has collaborated with notable coworkers such as Brian J Grenon and Richard Alan Haight. These collaborations have further enriched his work and contributed to advancements in photomask repair techniques.

Conclusion

Raymond E Rochefort's innovative methods for photomask repair demonstrate his commitment to enhancing technology in this field. His contributions, including 4 patents, reflect his expertise and the impact of his work at IBM.

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