Company Filing History:
Years Active: 2023
Title: Raven Persaud: Innovator in Semiconductor Technology
Introduction
Raven Persaud is a notable inventor based in Old Bridge, NJ (US). She has made significant contributions to the field of semiconductor technology, particularly with her innovative designs that enhance the handling of semiconductor wafers. Her work is characterized by a commitment to improving efficiency and precision in the manufacturing process.
Latest Patents
Raven holds a patent for a "Thin Material Handling Carrier." This wafer carrier features a thin, low-profile design that includes a bottom support plate for positioning a thinned semiconductor wafer. The carrier is equipped with a holding ring that surrounds the wafer's periphery, ensuring it remains securely in place. Additionally, the bottom support plate is designed with multiple apertures to facilitate vacuum pulling, along with features that engage with the holding ring and alignment fiducials. This design allows for accurate registration of the wafer's surface orientation with respect to testing equipment.
Career Highlights
Raven is currently employed at II-VI Delaware, Inc., where she continues to develop innovative solutions in semiconductor technology. Her work has been instrumental in advancing the capabilities of wafer handling systems, contributing to the overall efficiency of semiconductor manufacturing processes.
Collaborations
Raven has collaborated with several talented individuals in her field, including John William Stayt, Jr. and Thomas Barrie. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Raven Persaud is a pioneering inventor whose contributions to semiconductor technology are noteworthy. Her innovative designs, particularly the Thin Material Handling Carrier, demonstrate her commitment to enhancing the efficiency and precision of wafer handling. Through her work at II-VI Delaware, Inc. and her collaborations with esteemed colleagues, she continues to make a significant impact in her field.