Chicago, IL, United States of America

Raul Zavala


 

Average Co-Inventor Count = 3.5

ph-index = 1


Company Filing History:


Years Active: 2017-2025

Loading Chart...
Loading Chart...
6 patents (USPTO):Explore Patents

Title: Innovations by Raul Zavala

Introduction

Raul Zavala is an accomplished inventor based in Chicago, IL. He has made significant contributions to the field of chemical engineering, particularly in processes related to carbon dioxide separation and hydrocarbon conversion. With a total of 6 patents to his name, Zavala continues to push the boundaries of innovation in his industry.

Latest Patents

Zavala's latest patents include a process for separating a carbon dioxide product stream from a flue gas stream. This innovative process involves passing a stream of carbon dioxide and oxygen to a regenerator, generating a catalyst stream, and producing a flue gas stream that comprises carbon oxides, nitrogen oxides, catalyst fines, oxygen, and water. Additionally, he has developed a method for integrating a dehydrogenation unit and an alkylation unit for use in hydrocarbon conversion processes. This integration enhances the efficiency of isomerization units located off the deisobutanizer and the debutanizer.

Career Highlights

Zavala works at UOP LLC, a company renowned for its advancements in refining and petrochemical technologies. His work has not only contributed to the company's success but has also positioned him as a key player in the field of chemical engineering.

Collaborations

Throughout his career, Zavala has collaborated with notable colleagues, including Charles P. Luebke and Christopher D. DiGiulio. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Raul Zavala's innovative work in chemical engineering exemplifies the spirit of invention and collaboration. His contributions continue to impact the industry positively, showcasing the importance of research and development in addressing modern challenges.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…