Company Filing History:
Years Active: 1998
Title: Rand Dannenberg: Innovator in Film Application Technology
Introduction
Rand Dannenberg is a notable inventor based in Huntington, NY (US). He has made significant contributions to the field of film application technology, holding one patent that showcases his innovative approach.
Latest Patents
Dannenberg's patent, titled "Method of applying a film to a substrate," describes a sophisticated process for applying a film in a predetermined pattern. The method involves applying a solution of a copolymer of fluoropolymers dissolved in a solvent onto the substrate's surface. The solution is then cured and annealed to remove the solvent, forming a copolymer film. Following this, a thin metal film is deposited on the copolymer film, which is then patterned using a photoresist etching process. This process exposes the underlying copolymer film according to the predetermined pattern. The exposed copolymer film is removed, revealing the substrate beneath. Any remaining thin metal film is also eliminated, and the film is deposited onto the remaining copolymer film and exposed substrate. Finally, the remaining copolymer film and any applied film are removed through ultrasonic cleaning.
Career Highlights
Rand Dannenberg is associated with Servo Corporation of America, where he applies his expertise in film application technology. His work has contributed to advancements in various applications, enhancing the efficiency and effectiveness of film application processes.
Collaborations
Due to space constraints, the collaborations section will be omitted.
Conclusion
Rand Dannenberg's innovative methods in film application technology demonstrate his significant impact on the field. His patent reflects a deep understanding of materials and processes, paving the way for future advancements in this area.