Company Filing History:
Years Active: 2002
Title: Ralph D Knox: Innovator in Dielectric Materials for Magnetoresistive Heads
Introduction
Ralph D Knox is a notable inventor based in Minneapolis, MN (US). He has made significant contributions to the field of materials science, particularly in the development of dielectric materials for magnetoresistive (MR) heads. His innovative work has led to the granting of a patent that enhances the performance of MR heads used in various applications.
Latest Patents
Ralph D Knox holds a patent for a dielectric gap material specifically designed for magnetoresistive heads with conformal step coverage. The patent describes a silicon nitride dielectric film that comprises from about 38% to 44% by volume of silicon (Si), from about 35% to 37% by volume of nitrogen (N), and from about 21% to 24% by volume of hydrogen (H). This dielectric film is formed through plasma enhanced chemical vapor deposition (PECVD) at relatively low temperatures. The process involves introducing a plurality of gases capable of reacting to form silicon nitride into a PECVD reactor, where an electric field is generated to produce a plasma. The gases react in the presence of the electrical field to create the silicon nitride dielectric film.
Career Highlights
Ralph D Knox is currently employed at Seagate Technology Incorporated, where he continues to work on innovative solutions in the field of data storage technology. His expertise in dielectric materials has been instrumental in advancing the performance of MR heads, which are critical components in hard disk drives.
Collaborations
Throughout his career, Ralph has collaborated with talented individuals such as Liu Yang and Jumna P Ramdular. These collaborations have fostered a creative environment that has led to significant advancements in their respective fields.
Conclusion
Ralph D Knox's contributions to the field of dielectric materials for magnetoresistive heads exemplify the impact of innovation in technology. His patent and ongoing work at Seagate Technology Incorporated highlight the importance of research and development in enhancing data storage solutions.