Company Filing History:
Years Active: 1988-1989
Title: Ralf Ohlenmacher: Innovator in Radiation-Sensitive Coating Solutions
Introduction
Ralf Ohlenmacher is a notable inventor based in Wiesbaden, Germany. He has made significant contributions to the field of radiation-sensitive coating solutions, holding two patents that showcase his innovative approach to this technology.
Latest Patents
Ohlenmacher's latest patents focus on a positive-working radiation-sensitive coating solution. This solution contains a radiation-sensitive compound, such as a 1,2-naphthoquinone diazide, or a combination of compounds that includes a C-O-C bond capable of being split by acid and a compound that generates a strong acid upon radiation. Additionally, it incorporates an organic solvent, specifically a mono-C1 to C4-alkyl ether of 1,2-propanediol. The resulting coating solution is less toxic and offers improved layer leveling compared to existing positive-working photoresist solutions.
Career Highlights
Ralf Ohlenmacher is associated with Hoechst Aktiengesellschaft, where he has been instrumental in developing advanced coating solutions. His work has contributed to enhancing the safety and effectiveness of radiation-sensitive materials used in various applications.
Collaborations
Ohlenmacher collaborates with Hans Ruckert, leveraging their combined expertise to push the boundaries of innovation in their field.
Conclusion
Ralf Ohlenmacher's contributions to radiation-sensitive coating solutions reflect his commitment to innovation and safety in technology. His patents demonstrate a significant advancement in the field, paving the way for future developments.