Osnabruck, Germany

Ralf-Burckhard Dethlefs


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Ralf-Burckhard Dethlefs: Innovator in Photographic Paper Support Manufacture

Introduction

Ralf-Burckhard Dethlefs is a notable inventor based in Osnabruck, Germany. He has made significant contributions to the field of photographic materials, particularly in the manufacture of paper support for photographic layers. His innovative approach has led to advancements that enhance the quality and durability of photographic products.

Latest Patents

Dethlefs holds a patent for a unique process in the manufacture of photographic paper support. This patent involves a paper support material that is coated on at least one side with a polyolefin layer containing a polyalkylene glycol. The specific formulation includes polyethylene glycol, polypropylene glycol, or a copolymer of ethylene oxide and propylene oxide, with precise weight percentages. The molecular weights of these compounds are carefully selected to optimize performance, ensuring that the final product meets high standards for photographic applications.

Career Highlights

Throughout his career, Ralf-Burckhard Dethlefs has been associated with Felix Schoeller GmbH & Co. KG, a company known for its expertise in specialty papers. His work has not only contributed to the company's reputation but has also positioned him as a key figure in the development of innovative photographic materials.

Collaborations

Dethlefs has collaborated with esteemed colleagues such as Wolfram Wysk and Bernd Scholz. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies in the field of photographic materials.

Conclusion

Ralf-Burckhard Dethlefs is a distinguished inventor whose work in photographic paper support manufacture has made a lasting impact on the industry. His innovative patent and collaborations with other experts highlight his commitment to advancing photographic technology.

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