Albuquerque, NM, United States of America

Rakesh Sehgal


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 101(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Rakesh Sehgal: Innovator in Supported Inorganic Membranes

Introduction

Rakesh Sehgal is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the field of materials science, particularly in the development of supported inorganic membranes. His innovative work has implications for various applications, including gas separation and catalysis.

Latest Patents

Rakesh Sehgal holds a patent for "Supported Inorganic Membranes." This invention involves membranes capable of molecular sieving, which exhibit high flux and selectivity. The membranes are designed to be substantially defect-free and less than about 100 nm thick. They feature an average critical pore radius of less than about 5 angstroms, with a narrow pore size distribution. The preparation method includes coating a porous substrate with a polymeric sol under low relative pressure conditions, followed by drying and calcining to produce the final membrane. Additionally, methods for derivatizing the surface of these membranes with metal alkoxides are provided. The membranes have diverse applications, including the separation of gaseous constituents and serving as catalysts or catalyst supports.

Career Highlights

Rakesh has worked with prominent institutions such as the University of New Mexico and Sandia National Laboratories. His experience in these organizations has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research.

Collaborations

Rakesh has collaborated with Charles Jeffrey Brinker, a fellow researcher in the field. Their partnership has likely enhanced the development and application of innovative membrane technologies.

Conclusion

Rakesh Sehgal's contributions to the field of supported inorganic membranes demonstrate his innovative spirit and dedication to advancing materials science. His work continues to influence various applications, showcasing the importance of research and development in this area.

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