Company Filing History:
1 out of 832,812 Years Active: 2003
Title: Innovations by Rajan A Beera
Introduction
Rajan A Beera is an accomplished inventor based in Arlington, TX (US). He has made significant contributions to the field of materials science, particularly in the application of charged particles to substrates. His innovative work has led to the development of a unique method for enhancing silicon substrates.
Latest Patents
Rajan A Beera holds a patent titled "Process and apparatus for applying charged particles to a substrate, process for forming a layer on a substrate, products made therefrom." This patent describes a method and apparatus for seeding silicon substrates with diamond particles through electrostatic seeding. The method includes the application of heat to form the particles into a layer or the chemical vapor deposition of a diamond layer onto the particles. The disclosed products include silicon substrates with electrostatically affixed diamond particles, which have a density of at least 10 particles per cm, and silicon substrates featuring a polycrystalline layer with a nucleation density of at least 10 particles per cm.
Career Highlights
Throughout his career, Rajan has demonstrated a commitment to advancing technology in his field. His innovative approaches have garnered attention and recognition, contributing to the ongoing evolution of materials science.
Collaborations
Rajan has worked alongside notable colleagues, including William David Brown and Ajay Prabhakar Malshe. Their collaborative efforts have further enhanced the impact of his inventions.
Conclusion
Rajan A Beera's contributions to the field of materials science through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the development of new materials and applications.