Company Filing History:
Years Active: 2004
Title: Rainer Käsmaier: Innovator in Lithography Technology
Introduction
Rainer Käsmaier is a notable inventor based in Fraunberg, Germany. He has made significant contributions to the field of lithography, particularly in the fabrication of integrated circuits. His innovative approach has led to advancements that are crucial for modern technology.
Latest Patents
Käsmaier holds a patent for a lithography method and lithography mask. This method involves patterning layers during the fabrication of integrated circuits. The mask used in this process can be either reflective or transmissive. The photosensitive layers are exposed to radiation emitted by a radiation source, specifically in the extreme ultraviolet region. This radiation is guided via the mask onto the photosensitive layers, enhancing the precision of the lithography process.
Career Highlights
Rainer Käsmaier is associated with Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has positioned him as a key player in the development of advanced lithography techniques. His expertise in this area has contributed to the company's reputation for innovation and quality in the semiconductor industry.
Collaborations
Käsmaier has collaborated with notable colleagues such as Günther Czech and Christoph Friedrich. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Rainer Käsmaier's contributions to lithography technology exemplify the importance of innovation in the semiconductor industry. His patent and work at Infineon Technologies AG highlight his role as a significant inventor in this field.