Rainer Butsch

Title: **Innovative Contributions of Rainer Butsch**

Introduction

Rainer Butsch is a notable inventor based in Fairport, NY, who has made significant contributions to the field of electron beam lithography through his innovative patents. With a total of three patents to his name, Butsch has focused on enhancing the precision and efficiency of critical dimension control in this advanced technology.

Latest Patents

Among Rainer Butsch's latest inventions is the "Emulation methodology for critical dimension control in E-Beam." This patent addresses the issue of across-chip line width variations and aims to eliminate repetitive deviations from the desired design pattern in E-Beam lithography. The methodology assesses each region of a patterned substrate, calculating the deviation and applying local biases accordingly. By modifying lithography system tool commands, Butsch's innovation allows for the production of patterned substrates that are free from these deviations, significantly improving the outcome of E-Beam lithography processes.

Another significant patent is the "Method for monitoring resist charging in a charged particle system." This involves the use of a reference plate registration scheme which detects resist charging in an electron beam lithography system. By comparing scans of a resist-coated substrate before and after charge application, Butsch's system effectively measures the magnitude of resist charging, allowing for enhanced control during the lithography process.

Career Highlights

Rainer Butsch is affiliated with the International Business Machines Corporation (IBM), a leading technology and consulting company. His work at IBM has positioned him at the forefront of innovations in lithography technology, contributing to significant advancements that benefit the industry as a whole.

Collaborations

Throughout his career, Rainer Butsch has collaborated closely with renowned colleagues, including John George Hartley and Werner Stickel. These collaborations have allowed for a rich exchange of ideas and have played a crucial role in the development of cutting-edge technologies within the field of electron beam lithography.

Conclusion

Rainer Butsch's inventive spirit and dedication to research and development are evident in his patents that enhance E-Beam lithography processes. His contributions not only reflect his personal expertise but also signify the importance of innovation within technology-driven industries. With ongoing collaborations and a commitment to excellence, Butsch continues to impact the field significantly.