Rack H Chung, Deceased

Title: The Legacy of Inventor Rack H Chung

Introduction: Rack H Chung, a notable inventor from Clifton Park, NY, made significant contributions to the field of silicone chemistry before his passing. With a total of eight patents to his name, his work primarily focused on the development of novel compounds and materials that have enhanced various applications in the industry.

Latest Patents: Rack H Chung's most recent patents include innovations in silicone compounds, specifically the creation of novel enoxy functional silanes described by the general formula: ##STR1##. This invention highlights the versatility of hydrocarbon radicals, where R.sup.1 ranges from a monovalent hydrocarbon radical consisting of 1 to 8 carbon atoms, and R.sup.2, R.sup.3, and R.sup.5 consist of 1 to 13 carbon atoms. His exploration into the novel scavengers for one-component RTV compositions resulted in a breakthrough with a shelf-stable, one-component alkoxy-functional RTV composition. This composition incorporates an alkoxy-functional silazane compound that can function both as a scavenger and an integrated cross-linking agent, whether cyclic or linear.

Career Highlights: Throughout his career, Rack H Chung held positions at respected organizations such as General Electric Company and Usv Pharmaceutical Corporation. His work was highly regarded and had a lasting impact on the field of silicones and materials science.

Collaborations: During his innovative journey, Rack collaborated with notable individuals in the industry, including coworkers John T Suh and Nai-Yi Wang. These collaborations contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion: Rack H Chung's contributions to the realm of silicone compounds and RTV formulations reflect his ingenuity and dedication as an inventor. His legacy continues through the patents he left behind, which serve as a testament to his creativity and the importance of innovation in material science.