Quinwei Wu

Title: Innovations by Quinwei Wu in Electrochemical Plating Technology

Introduction

Quinwei Wu is an accomplished inventor based in Westford, MA (US). He has made significant contributions to the field of electrochemical plating technology. His innovative work has led to the development of a patent that addresses critical aspects of anode impedance control.

Latest Patents

Quinwei Wu holds a patent titled "Anode impedance control through electrolyte flow control." This invention provides an electrochemical plating cell that includes an electrolyte container assembly designed to hold a plating solution. The head assembly is positioned above the electrolyte container and supports a substrate during the electrochemical plating process. The anode assembly, located in the lower portion of the electrolyte container, features a copper member with a substantially planar upper surface. This surface includes grooves that originate from the center and extend to the perimeter, along with fluid outlets positioned at the perimeter of the anode surface. This innovative design enhances the efficiency of the electrochemical plating process.

Career Highlights

Quinwei Wu is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to focus on advancing technologies that improve manufacturing processes in the semiconductor and display industries.

Collaborations

Quinwei has collaborated with notable colleagues, including Harald Herchen and Craig L Brodeur. These collaborations have contributed to the development of innovative solutions in the field of electrochemical plating.

Conclusion

Quinwei Wu's contributions to electrochemical plating technology through his patent demonstrate his expertise and commitment to innovation. His work continues to influence advancements in the industry, showcasing the importance of research and development in technology.