Quentin Chen

Title: Innovations of Quentin Chen in Optical Correction

Introduction

Quentin Chen is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of photolithography through his innovative methods. His work focuses on improving the accuracy and efficiency of optical correction processes.

Latest Patents

Quentin Chen holds a patent for a "Method of optical correction for improving the pattern shrinkage caused by scattering of the light." This invention addresses the challenges faced during photolithography processes. By providing aid patterns on photomasks, his method eliminates the need for serifs or hammerheads, thereby reducing costs. The invention utilizes a chrome aid block positioned between the edges of the patterns, with its size ranging from one-third to one-half the wavelength of light used during exposure. This approach effectively minimizes pattern shrinkage caused by light scattering and prevents the formation of additional blocks on the photoresist layer. Furthermore, it mitigates the standing wave effect, resulting in more accurate pattern transfers.

Career Highlights

Quentin Chen is associated with Nan Ya Technology Corporation, where he applies his expertise in optical correction. His innovative approach has garnered attention in the industry, showcasing his commitment to advancing photolithography techniques.

Collaborations

Quentin collaborates with talented individuals such as Ronfu Chu and Chungwei Hsu. Their combined efforts contribute to the development of cutting-edge technologies in their field.

Conclusion

Quentin Chen's contributions to optical correction in photolithography highlight his innovative spirit and dedication to improving manufacturing processes. His patent reflects a significant advancement in the industry, paving the way for more efficient and accurate pattern transfers.