Company Filing History:
Years Active: 2017-2018
Title: Qiyan Feng: Innovator in Semiconductor Technology
Introduction
Qiyan Feng is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to complex engineering challenges.
Latest Patents
One of his latest patents is titled "Method for forming high aspect ratio patterning structure." This invention discloses a method for creating high aspect ratio patterns on semiconductor substrates. The process involves forming a dielectric film ashing stop layer, a first photoresist layer, a first hard mask layer, and a second photoresist layer sequentially. A second hard mask layer, which has a high etch selectivity ratio with the first photoresist layer, is then formed using a low-temperature chemical vapor deposition process. This method effectively protects the pattern sidewall during the etching process, avoiding issues such as cone-shaped or bowling-shaped photoresist morphology caused by plasma bombardment.
Another significant patent by Qiyan Feng is "Method for establishing mapping relation in STI etch and controlling critical dimension of STI." This invention provides a method for controlling the critical dimension of shallow trench isolations during the STI etch process. It involves pre-establishing a mapping relation between the post-etch and pre-etch critical dimension differences of a BARC layer and its thickness. By measuring the thickness of the BARC layer during the etch process, the trimming time for a hard mask layer can be determined, ensuring that the critical dimension of the hard mask layer aligns with the required dimensions of the active area.
Career Highlights
Qiyan Feng is currently employed at Shanghai Huali Microelectronics Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
He collaborates with talented coworkers, including Yu Ren and Yukun Lv, who contribute to the innovative environment at Shanghai Huali Microelectronics Corporation.
Conclusion
Qiyan Feng's contributions to semiconductor technology through his patents and work at Shanghai Huali Microelectronics Corporation highlight his role as a key innovator in the field. His inventions not only address current challenges but also pave the way for future advancements in semiconductor manufacturing.