Company Filing History:
Years Active: 2024-2025
Title: The Innovations of Qiushi Huang
Introduction: Qiushi Huang is an inventor based in Shanghai, China, who is currently associated with Carl Zeiss SMT GmbH. His work primarily focuses on advancements in optical systems, particularly in the field of extreme ultraviolet (EUV) technology. Although he does not hold any granted patents, his contributions to the field are noteworthy.
Latest Patent Applications: Qiushi Huang has submitted a patent application for an innovative multilayer mirror designed to reflect extreme ultraviolet radiation. The application details a multilayer mirror that includes a substrate and a stack of layers composed of both low and high index materials. The low index material has a lower real part of the refractive index compared to the high index material at a specific operating wavelength. Additionally, the stack features a spectral purity filter that enhances the EUV-UV reflectivity ratio of the multilayer mirror. This filter is designed to reduce reflectivity in the ultraviolet radiation range, thereby improving the overall performance of the optical system.
Conclusion: Qiushi Huang's work in the field of optical systems, particularly with his latest patent application, showcases his innovative approach to enhancing multilayer mirror technology. His contributions, although not yet reflected in granted patents, hold significant potential for advancements in the industry.