Company Filing History:
Years Active: 2024-2025
Title: Qingmin Cheng: Innovator in Polishing Compositions
Introduction
Qingmin Cheng is a notable inventor based in Mesa, AZ (US). He has made significant contributions to the field of polishing compositions, holding a total of 2 patents. His work focuses on innovative methods and compositions that enhance polishing processes.
Latest Patents
Qingmin Cheng's latest patents include advancements in polishing compositions and methods of using the same. These compositions consist of several key components: at least one abrasive, at least one organic acid or a salt thereof, at least one first amine compound that includes an alkylamine with a 6-24 carbon alkyl chain, at least one second amine compound containing at least two nitrogen atoms, and an aqueous solvent. This innovative approach aims to improve the efficiency and effectiveness of polishing applications.
Career Highlights
Qingmin Cheng is currently employed at Fujifilm Electronic Materials U.S.A., Inc. His role at the company allows him to apply his expertise in developing advanced materials and processes that cater to various industrial needs. His contributions have been instrumental in enhancing the quality and performance of polishing materials.
Collaborations
Some of Qingmin Cheng's coworkers include Bin Hu and Yannan Liang. Their collaborative efforts contribute to the innovative environment at Fujifilm Electronic Materials, fostering advancements in technology and product development.
Conclusion
Qingmin Cheng is a distinguished inventor whose work in polishing compositions has made a significant impact in the industry. His patents reflect a commitment to innovation and excellence in material science.