Shanghai, China

Qingjie Lu


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 4(Granted Patents)


Years Active: 2023-2025

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: Qingjie Lu: Innovator in Power Spectral Density Measurement

Introduction

Qingjie Lu is a notable inventor based in Shanghai, China, recognized for his contributions to the field of power spectral density measurement. With a total of four patents to his name, he has made significant advancements in the removal of intermodulation interference and noise from device signals.

Latest Patents

Qingjie Lu's latest patents focus on innovative methods for enhancing the accuracy of power spectral density measurements. One of his patents describes a method that involves receiving a device signal from a device under test (DUT), setting an attenuation value, and applying this value to produce an attenuated device signal. This process allows for the analysis of noise signals and intermodulation interference, ultimately leading to the acquisition of multiple power spectral density values. Another patent outlines a similar approach, emphasizing the removal of test equipment noise from power spectral density measurements, ensuring that the device signal is accurately represented.

Career Highlights

Qingjie Lu is currently employed at Litepoint Corporation, where he continues to develop and refine his innovative techniques. His work has significantly impacted the field, providing solutions that enhance the reliability of measurements in various applications.

Collaborations

Throughout his career, Qingjie Lu has collaborated with talented individuals such as Christian Volf Olgaard and Ruizu Wang. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Qingjie Lu's contributions to the field of power spectral density measurement exemplify his dedication to innovation and excellence. His patents not only address critical challenges in the industry but also pave the way for future advancements.

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