Qin Jang

Title: Innovator Qin Jang and His Contributions to Semiconductor Technology

Introduction

Qin Jang, an inventive mind based in Calabasas, California, has made a noteworthy contribution to the field of semiconductor technology. He holds a patent for a low dielectric constant film, demonstrating his expertise and innovative approach in materials science.

Latest Patents

Qin Jang's patent titled "Low dielectric constant film and method thereof" introduces a dielectric film composed of silicon, oxygen, and carbon, which exhibits a low dielectric constant with superior thermal stability and adhesion to standard semiconductor materials. This film is formed from a polyorganosilane polymer applied to a substrate and cured through a two-step or three-step process. Its applications are particularly advantageous for damascene, double damascene, and interlayer dielectric applications, highlighting its significance in advancing semiconductor manufacturing processes.

Career Highlights

Throughout his career, Qin Jang has demonstrated a commitment to innovation within the technological landscape. His unique patent positions him as a notable inventor in the semiconductor industry, drawing attention to the potential of low dielectric constant materials in enhancing device performance.

Collaborations

Qin Jang has collaborated with exceptional colleagues such as Cheng-Jye Chu and Wei Qiang, contributing to collective innovations in their field. Their partnerships reflect a collaborative spirit that is essential for driving technological advancements.

Conclusion

In summary, Qin Jang's innovative work in developing a low dielectric constant film stands as a testament to his capabilities as an inventor in semiconductor technology. His dedication and collaboration with fellow researchers continue to pave the way for significant advancements in the industry.