Company Filing History:
Years Active: 2023
Title: Qifeng Ruan: Innovator in Patterned Structure Technology
Introduction
Qifeng Ruan is a notable inventor based in Singapore, recognized for his contributions to the field of patterned structure technology. He has developed innovative methods that enhance the fabrication processes in various applications.
Latest Patents
Qifeng Ruan holds a patent for a "Method of forming a patterned structure and device thereof." This patent describes a comprehensive method that includes forming a resist layer on a substrate, exposing a portion of the resist layer to a focused electron beam, and performing plasma treatment to create a patterned structure. His invention significantly advances the techniques used in microfabrication.
Career Highlights
Qifeng Ruan is affiliated with the Singapore University of Technology and Design, where he contributes to research and development in advanced manufacturing technologies. His work has garnered attention for its practical applications in various industries.
Collaborations
He collaborates with esteemed colleagues, including You Sin Tan and Joel Yang, who share his passion for innovation and research in technology.
Conclusion
Qifeng Ruan's contributions to the field of patterned structure technology exemplify the spirit of innovation. His work continues to influence advancements in microfabrication techniques.