Qidu Jiang

Title: **Innovative Contributions of Qidu Jiang in CVD Technologies**

Introduction

Qidu Jiang, an accomplished inventor based in Plano, Texas, has made significant strides in the field of chemical vapor deposition (CVD) technology. With a total of three patents to his name, his work focuses on enhancing the efficiency and effectiveness of CVD processes, which are critical in various semiconductor manufacturing applications.

Latest Patents

Qidu Jiang's latest patents showcase innovative advancements in CVD showerhead designs. His first notable invention is a CVD showerhead that incorporates a circular inner showerhead along with at least one outer ring showerhead, designed to optimize the delivery of process gases. Additionally, Jiang developed a dual showerhead configuration where each showerhead is connected to a mixture of gases, including oxygen and organometallics like lead, zirconium, and titanium. These innovations also detail methods for depositing CVD thin films and PZT thin films on wafers, which are essential for developing high-performance electronic devices.

Career Highlights

Throughout his career, Qidu Jiang has been associated with Texas Instruments Corporation, a leading company in the semiconductor industry. His contributions have not only advanced CVD technology but have also solidified his reputation within the industry as a thought leader in innovative deposition techniques.

Collaborations

In his role at Texas Instruments, Jiang has collaborated with prominent colleagues, including Brian Goodlin and Jin Zhao. These partnerships have fostered a dynamic environment for innovation, allowing for the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Qidu Jiang's inventive spirit and dedication to advancing CVD technologies have positioned him as a notable figure in the semiconductor landscape. His patented innovations not only illustrate his technical expertise but also contribute significantly to the future of semiconductor manufacturing processes.