Company Filing History:
Years Active: 2023
Title: Qi Zhao - Innovator in Scour-Resistant Interface Enhancers
Introduction
Qi Zhao is a notable inventor based in Qingdao, China. He has made significant contributions to the field of well cementing, particularly in the context of coalbed methane wells. His innovative approach has led to the development of a unique scour-resistant interface enhancer that addresses critical challenges in cementing processes.
Latest Patents
Qi Zhao holds a patent for a scour-resistant interface enhancer used for well cementing of coalbed methane wells. The patent describes a preparation method and application of a compound solution that includes a 0.1% surfactant CAEO-15 and a 0.3% silane coupling agent. This solution is prepared using a mass ratio of clear water to absolute ethanol of 9:1. The enhancer demonstrates excellent wettability modification effects, a scour-resistant effect against cement slurry, and good compatibility with cement slurry systems. It significantly improves the cementing strength and air tightness of the interfaces in coalbed methane wells, thereby enhancing the overall cementing quality.
Career Highlights
Throughout his career, Qi Zhao has worked with esteemed institutions such as the China University of Petroleum and the Guizhou Engineering Research Institute of Oil & Gas Exploration and Development. His work has been instrumental in advancing technologies related to well cementing and enhancing the efficiency of coalbed methane extraction.
Collaborations
Qi Zhao has collaborated with notable colleagues, including Shenglai Guo and Yuhuan Bu. Their combined expertise has contributed to the successful development and application of innovative solutions in the field.
Conclusion
Qi Zhao's contributions to the field of well cementing through his patented scour-resistant interface enhancer highlight his innovative spirit and dedication to improving industry practices. His work continues to influence the efficiency and effectiveness of coalbed methane well operations.