Pratheep Gunaseelan

Title: Pratheep Gunaseelan: Innovator in Remote Plasma Technology

Introduction

Pratheep Gunaseelan is a notable inventor based in Fremont, California. He has made significant contributions to the field of plasma technology, particularly in the development of apparatuses that enhance etching processes.

Latest Patents

Gunaseelan holds a patent for an "Apparatus for generating etchants for remote plasma processes." This innovative remote plasma source (RPS) utilizes symmetrical hollow cathode cavities to increase etchant rates. The design includes an upper electrode with a first hollow cavity and a lower electrode with a second hollow cavity, both configured to induce a hollow cathode effect. The symmetrical arrangement of these cavities, along with a carefully designed annular dielectric cover, optimizes the etching process.

Career Highlights

Pratheep Gunaseelan is currently employed at Applied Materials, Inc., where he continues to push the boundaries of technology in the semiconductor industry. His work focuses on improving processes that are critical for manufacturing advanced electronic devices.

Collaborations

Gunaseelan collaborates with talented professionals in his field, including coworkers Tae Seung Cho and David Benjaminson. Their combined expertise contributes to the innovative environment at Applied Materials, Inc.

Conclusion

Pratheep Gunaseelan's contributions to remote plasma technology exemplify the spirit of innovation in the semiconductor industry. His patent and ongoing work at Applied Materials, Inc. highlight his role as a key inventor in advancing etching processes.