Company Filing History:
Years Active: 2000-2003
Title: Po Tang - Innovator in Vaporization and Deposition Technologies
Introduction
Po Tang is a notable inventor based in San Jose, CA (US), recognized for his contributions to vaporization and deposition technologies. He holds 4 patents that focus on advanced methods for material deposition, particularly in the semiconductor industry. His work has significantly impacted the development of integrated circuit capacitors.
Latest Patents
Among his latest patents is a high-temperature filter for CVD apparatus. This invention provides a deposition chamber designed for materials that require vaporization, especially low volatility precursors. The chamber features heated temperature-controlled internal liners that serve as vaporizing surfaces, ensuring the efficient transport of materials at elevated temperatures. This design prevents unwanted condensation on chamber components, which is crucial for maintaining the integrity of the deposition process. Another significant patent involves a vaporization and deposition apparatus that facilitates the deposition of metal-oxide films, such as barium, strontium, titanium oxide (BST) films, on silicon wafers. This technology is essential for creating integrated circuit capacitors used in high-capacity dynamic memory modules.
Career Highlights
Po Tang has worked with prominent companies in the field, including Applied Materials, Inc. His experience in these organizations has allowed him to refine his expertise in vaporization and deposition technologies, contributing to advancements in semiconductor manufacturing.
Collaborations
Throughout his career, Po has collaborated with notable professionals, including Jun Zhao and Frank P Chang. These collaborations have fostered innovation and the development of cutting-edge technologies in the industry.
Conclusion
Po Tang's innovative work in vaporization and deposition technologies has made a significant impact on the semiconductor industry. His patents reflect a commitment to advancing material deposition methods, which are crucial for the development of modern electronic devices.