This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 834,513 Years Active: 2013
Title: Po-Lun Wu: Innovator in Metallic Nitride Film Technology
Introduction
Po-Lun Wu is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of methods for forming metallic nitride films. His innovative approach has implications for various applications in technology and manufacturing.
Latest Patents
Wu holds a patent for a method for forming a metallic nitride film. This method involves several steps, including providing a target made of titanium or zirconium and a substrate in a vacuum chamber. The process includes forming a metallic film, specifically a TiN or ZrN film, on the substrate's surface through sputtering deposition. The conditions maintained during this process include a working pressure in the vacuum chamber ranging from 5×10 Torr to 5×10 Torr. Additionally, a gas mixture of air and argon is introduced at a flow rate ratio of air to argon between 5:100 and 15:100. A direct current power ranging from 100 Watts to 5000 Watts is applied by a power supply. This method is advantageous due to its simple equipment requirements, time-effective manufacturing processes, and low cost.
Career Highlights
Throughout his career, Po-Lun Wu has focused on advancing technologies related to metallic films. His innovative methods have garnered attention for their efficiency and effectiveness in manufacturing processes. Wu's work has contributed to the broader field of materials science, enhancing the capabilities of various industries.
Collaborations
Wu has collaborated with notable colleagues, including Fu-Hsing Lu and Jiun-Huei Yang. These collaborations have fostered a productive environment for innovation and research, leading to advancements in their respective fields.
Conclusion
Po-Lun Wu's contributions to the development of metallic nitride film technology highlight his role as an influential inventor. His patented methods demonstrate a commitment to innovation and efficiency in manufacturing processes. Wu's work continues to impact the field of materials science positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile