Paris, France

Pierre Mazars


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Pierre Mazars: Innovator in Chemical Plating Technology

Introduction

Pierre Mazars is a notable inventor based in Paris, France. He has made significant contributions to the field of chemical plating, particularly with his innovative patent that addresses the use of reducing agents in nickel and cobalt plating baths. His work is essential for advancing the technology used in various industrial applications.

Latest Patents

Pierre Mazars holds a patent for a nickel and/or cobalt chemical plating bath using a reducing agent based on boron or phosphorus. This innovative plating bath comprises a salt of the metal(s) to be deposited, one or more complexing agents of said metal(s), a reducing agent, and a stabilizing agent. The stabilizing agent is designed to avoid including sources of corrosion and/or toxic substances in the plating process. It consists of a water-soluble organic compound that possesses a readily accessible electron pair, ensuring that it does not include any metal or metalloid from specific groups that could be harmful.

Career Highlights

Pierre Mazars is associated with the Office National d'Études et de Recherche Aérospatiales, where he has contributed to various research and development projects. His expertise in chemical plating has positioned him as a valuable asset in the aerospace sector, where precision and safety are paramount.

Collaborations

Some of his notable coworkers include Pierre Josso and Pierre Lepetit. Their collaborative efforts have further enhanced the research and development initiatives within their organization.

Conclusion

Pierre Mazars is a distinguished inventor whose work in chemical plating technology has made a significant impact in the industry. His innovative approaches continue to influence advancements in plating processes, ensuring safer and more efficient applications.

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