Company Filing History:
Years Active: 1984
Title: Pierre Lepetit: Innovator in Chemical Plating Technology
Introduction
Pierre Lepetit is a notable inventor based in Saint Vrain, France. He has made significant contributions to the field of chemical plating, particularly through his innovative patent that addresses the use of reducing agents in nickel and cobalt plating baths. His work is essential for advancing the technology used in various industrial applications.
Latest Patents
Pierre Lepetit holds a patent for a nickel and/or cobalt chemical plating bath that utilizes a reducing agent based on boron or phosphorus. This innovative plating bath comprises a salt of the metal(s) to be deposited, one or more complexing agents, and a stabilizing agent. The stabilizing agent is designed to avoid sources of corrosion and toxic substances, incorporating a water-soluble organic compound that possesses a readily accessible electron pair. Notably, this compound does not include any metal or metalloid from specific groups, ensuring a safer and more efficient plating process.
Career Highlights
Pierre Lepetit is associated with the Office National D'études Et De Recherche Aérospatiales, where he has contributed to various research and development projects. His expertise in chemical processes has positioned him as a valuable asset in the aerospace sector. His innovative approach to chemical plating has garnered attention and respect within the industry.
Collaborations
Pierre Lepetit has worked alongside notable colleagues such as Pierre Josso and Pierre Mazars. Their collaborative efforts have furthered advancements in their respective fields, contributing to the success of their projects.
Conclusion
Pierre Lepetit is a distinguished inventor whose work in chemical plating technology has made a significant impact. His innovative patent and contributions to the aerospace industry highlight his role as a key figure in advancing chemical processes. His dedication to innovation continues to inspire future developments in the field.