Aalen, Germany

Philipp Hügler

This inventor holds 2 USPTO granted patents and 3 published patent applications and 1 EPO patent. Top assignee: Endress+hauserse+co. Kg. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Philipp Hügler. Retrieved from https://idiyas.com/inventor/philipp-hügler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Philipp Hügler - Innovator in Radar-Based Fill Level Measurement

Introduction: Philipp Hügler is an inventor based in Aalen, Germany, known for his contributions to the field of radar-based measurement technology. He currently works at Endress+Hauser SE & Co. KG, where he collaborates with fellow innovator Winfried Mayer. Although he has not yet been granted any patents, his work in developing advanced measurement devices is noteworthy.

Latest Patent Applications: Philipp Hügler's latest patent applications include innovative designs for a fill level meter. This radar-based fill level measuring device is designed for measuring fill levels in containers through small, lateral openings. The device features a tubular antenna arrangement with a tube axis suitable for the container opening. In the tube end region that protrudes into the container, a radar-bundling means is arranged, oriented perpendicular to the fill substance. The compact design of the antenna arrangement is achieved through asymmetric apertures in both the radar-bundling means and the primary radiator, which enhance the device's functionality and efficiency.

Conclusion: Philipp Hügler's work in radar-based measurement technology showcases his innovative spirit and dedication to advancing the field. His contributions, although not yet reflected in granted patents, hold promise for future developments in fill level measurement devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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