Philip J Coane

Title: The Innovative Contributions of Philip J Coane

Introduction

Philip J Coane is a notable inventor based in Ruston, Louisiana. He has made significant contributions to the field of x-ray lithography, particularly through his innovative patent. His work is recognized for enhancing the commercial appeal of x-ray lithography processes.

Latest Patents

Coane holds a patent for a "Graphite mask for x-ray or deep x-ray lithography." This method allows for the production of x-ray masks on graphite substrates in an economical and rapid manner. The process eliminates the need for an intermediate x-ray mask by utilizing a less expensive intermediate UV lithography step. The absorber structures are electroplated directly onto the graphite, which is expected to greatly enhance the commercial viability of x-ray lithography in applications such as LIGA. The x-ray mask produced consists of a graphite substrate that supports an absorber, such as gold-on-nickel. The thickness of the absorber structures can be adjusted to provide sufficient contrast for various applications.

Career Highlights

Coane is affiliated with Louisiana State University and Agricultural & Mechanical College, where he continues to contribute to research and innovation in his field. His work has implications for various industries that rely on advanced lithography techniques.

Collaborations

Coane has collaborated with notable colleagues, including Jost S Göttert and Kevin W Kelly. Their combined expertise has furthered advancements in the technology surrounding x-ray lithography.

Conclusion

Philip J Coane's innovative work in the field of x-ray lithography exemplifies the impact of research and development in advancing technology. His contributions are expected to influence the future of lithography processes significantly.