Philip D Corey, Jr

Title: The Innovations of Philip D Corey, Jr.

Introduction

Philip D Corey, Jr. is an accomplished inventor based in Wenham, MA (US). He has made significant contributions to the field of ion implantation technology. His innovative work has led to the development of a unique patent that addresses critical aspects of ion dose measurement and uniformity.

Latest Patents

Corey holds a patent for a "Dose measurement and uniformity monitoring system for ion implantation." This apparatus is designed to determine ion dose and ion dose uniformity of an ion beam scanned over a target plane. The system responds to scanning signals and includes a mask assembly that senses the beam current at various locations, providing a single beam current signal. The mask assembly features a mask plate with sensing apertures and an annular Faraday cup aligned with these apertures to measure beam current. The integrated beam current signal over time allows for accurate determination of ion dose. Additionally, a demultiplexer separates the beam current signal into distinct components from each sensing aperture, enabling the assessment of ion dose uniformity by comparing these components with an average value.

Career Highlights

Corey has been associated with Varian Associates, Inc., where he has applied his expertise in ion implantation technology. His work has been instrumental in advancing the capabilities of ion beam applications in various industries.

Collaborations

Throughout his career, Corey has collaborated with notable colleagues, including Paul M Lundquist and Robert V Brick. These partnerships have contributed to the successful development and implementation of innovative technologies in the field.

Conclusion

Philip D Corey, Jr. is a notable inventor whose work in ion implantation technology has led to significant advancements in the industry. His patent for a dose measurement and uniformity monitoring system exemplifies his commitment to innovation and excellence.