Philip Chiu

Title: The Innovations of Philip Chiu

Introduction

Philip Chiu is an accomplished inventor based in Edison, NJ (US). He has made significant contributions to the field of photoresist technology, particularly in the development of highly sensitive materials for advanced applications. His work has implications for various industries, including semiconductor manufacturing.

Latest Patents

Philip Chiu holds a patent for a "Highly sensitive dry developable deep UV photoresist." This innovative material is characterized by its high sensitivity and absorption capabilities in deep ultraviolet and vacuum ultraviolet ranges. The photoresist comprises a novolak resin protected with an acid labile group and a photoinitiator that generates a strong acid upon exposure to specific radiation. The exposed resists can be reacted with organometallic compounds to create reactive ion etch resistant patterns, showcasing a significant advancement in photoresist technology.

Career Highlights

Chiu is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of innovation in his field. His work at IBM has allowed him to collaborate with some of the brightest minds in technology, contributing to the company's reputation as a leader in research and development.

Collaborations

Throughout his career, Philip has worked alongside notable colleagues such as William R Brunsvold and Willard E Conley. These collaborations have fostered an environment of innovation and creativity, leading to groundbreaking advancements in their respective fields.

Conclusion

Philip Chiu's contributions to the field of photoresist technology exemplify the spirit of innovation. His patented work and collaborations at IBM highlight his commitment to advancing technology and improving manufacturing processes. His achievements serve as an inspiration for future inventors and innovators.