Boxborough, MA, United States of America

Philip C Lessard


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 1996

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Philip C. Lessard

Introduction

Philip C. Lessard is a notable inventor based in Boxborough, MA (US). He has made significant contributions to the field of cryogenics, particularly through his innovative patent related to cryopump technology. His work has implications for various applications in scientific and industrial settings.

Latest Patents

Lessard holds a patent for a "Pressure controlled cryopump regeneration method and system." This invention involves a subatmospheric regeneration process where a relief valve and a roughing valve are coupled in parallel to a common roughing pump. During the regeneration phase, the cryopump is warmed to release gases from its stages. The relief valve opens at a first cryopump pressure level that is less than a predetermined maximum pressure, which is subatmospheric. The relief valve then closes when the cryopump pressure drops below a second pressure level. Additionally, the pressure in a line between the relief valve and the roughing pump is monitored to control the opening of the roughing valve to the roughing pump.

Career Highlights

Philip C. Lessard has been associated with Helix Technology Corporation, where he has contributed to advancements in cryogenic technology. His expertise and innovative mindset have positioned him as a valuable asset in his field.

Collaborations

Throughout his career, Lessard has worked alongside notable colleagues such as Bruce R. Andeen and Gerald J. Fortier. Their collaborative efforts have further enhanced the development of innovative technologies in their respective areas.

Conclusion

Philip C. Lessard's contributions to cryogenic technology through his patent demonstrate his innovative spirit and dedication to advancing scientific knowledge. His work continues to influence the field and inspire future innovations.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…