York, United Kingdom

Petr Sehnel


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Petr Sehnel in Polyacrylate Development

Introduction

Petr Sehnel, an accomplished inventor based in York, GB, has made notable strides in the field of polymer chemistry. With a patented innovation, he has contributed significantly to the development of polyacrylates, a crucial material in various industries.

Latest Patents

Petr Sehnel holds a patent titled "Routes to polyacrylates." This innovative patent describes a method for obtaining polyacrylate through the radical polymerization of at least one acrylate monomer. The process employs a polymeric photoinitiator, which consists of a co-polymer of a photoinitiator monomer and additional monomers. This invention allows for rapid polymerization of acrylate monomers, thus enhancing the efficiency of polyacrylate production.

Career Highlights

Currently, Petr is affiliated with Coloplast A/S, where he applies his expertise in polymer chemistry to drive innovative projects. His work focuses on developing new materials that serve various applications, making significant impacts in his field. His singular patent showcases his commitment to advancing technology in polymer science.

Collaborations

Petr Sehnel collaborates closely with peers such as Niels Joergen Madsen and Christian B. Nielsen, enhancing the innovative efforts within Coloplast A/S. These collaborations foster a dynamic environment that encourages the exchange of ideas and advancements in research.

Conclusion

Petr Sehnel's contributions to the field of polyacrylates illustrate the invaluable role of inventors in advancing scientific knowledge and technological applications. His unique approach to polymerization through the use of polymeric photoinitiators sets a precedent in the industry, paving the way for future innovations in material science.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…