Peter P Leong, Executor

Title: The Innovations of Peter P. Leong, Executor

Introduction

Peter P. Leong is an accomplished inventor based in Vancouver, Canada. He has made significant contributions to the field of materials science, particularly in the area of etching processes for silicides and polycrystalline silicon. His work has implications for various applications in semiconductor manufacturing.

Latest Patents

Peter P. Leong holds a patent titled "Materials and methods for etching silicides." This patent describes a gas chemistry and a related RIE mode process for etching silicides of refractory metals such as titanium, tantalum, tungsten, and aluminum. The process also includes etching composites of these silicides on polycrystalline silicon layers. Notably, BCl3 is added to the HCl/Cl2 gas chemistry used for the polysilicon etch, along with selected additives from fluorinated gases and oxygen. This innovation addresses the multiple requirements of a two-step silicide-polysilicon etch process, including the silicide-to-polysilicon etch ratio requirement. He has 1 patent to his name.

Career Highlights

Peter P. Leong has built a successful career at Applied Materials, Inc., where he has been instrumental in advancing etching technologies. His expertise in gas chemistry and etching processes has made him a valuable asset to the company. His work has contributed to the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Peter has collaborated with notable colleagues, including David N. Wang and Mei Yin Chang. These collaborations have fostered innovation and have led to advancements in their respective fields.

Conclusion

Peter P. Leong is a notable inventor whose work in etching processes has made a significant impact in the semiconductor industry. His contributions continue to influence advancements in materials science and technology.