Round Rock, TX, United States of America

Peter H Kessler


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 1986-1988

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2 patents (USPTO):Explore Patents

Title: Innovations by Peter H Kessler

Introduction

Peter H Kessler is an accomplished inventor based in Round Rock, TX (US). He has made significant contributions to the field of gas injection apparatus and heat exchange technology. With a total of 2 patents, Kessler's work has been instrumental in advancing equipment used in low-pressure chemical vapor deposition (LPCVD).

Latest Patents

Kessler's latest patents include a "Multiple gas injection apparatus for LPCVD equipment." This invention features a quick-release multiple gas injection pipe connector fitting that allows for the removable attachment to a gas reaction chamber with multiple gas injection passages. The design enables several gas inlet lines to be connected or disconnected in one operation, streamlining the process and ensuring that reaction gases are mixed only at the reaction site.

Another notable patent is the "Heat exchange apparatus for high temperature LPCVD equipment." This apparatus consists of two sleeves that fit together to create a sealed sinuous heat exchange fluid channel. The channel is designed for easy cleaning, allowing for direct access along its entire length, which is a significant improvement over conventional heat exchangers that require access only from the ends. The rectangular cross-section of the channel enhances the heat exchange capability of the apparatus.

Career Highlights

Peter H Kessler is currently employed at Motorola Corporation, where he continues to innovate and develop new technologies. His work has had a lasting impact on the efficiency and effectiveness of LPCVD equipment.

Collaborations

Kessler has collaborated with notable colleagues such as Wilson D Calvert and Faivel S Pintchovski. Their combined expertise has contributed to the successful development of advanced technologies in their field.

Conclusion

Peter H Kessler's contributions to the field of LPCVD technology through his innovative patents demonstrate his commitment to advancing engineering solutions. His work continues to influence the industry and inspire future innovations.

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