Company Filing History:
Years Active: 2013
Title: Innovations of Peter Almren Losee
Introduction
Peter Almren Losee is an accomplished inventor based in Clifton Park, NY (US). He is known for his significant contributions to the field of semiconductor technology, particularly in the development of MOSFET cell structures.
Latest Patents
Peter Almren Losee holds a patent for a "Silicon-carbide MOSFET cell structure and method for forming same." This invention comprises a MOSFET that includes individual MOSFET cells. Each cell features a U-shaped well (P type) and two parallel sources (N type) formed within the well. A number of source rungs (doped N) connect the sources at multiple locations. The regions between two rungs comprise a body (P type), and these features are formed on an N-type epitaxial layer, which is situated on an N-type substrate. A contact extends across and connects a number of source rungs and bodies. The gate oxide and a gate contact overlie a leg of a first well and a leg of a second adjacent well, inverting the conductivity in response to a gate voltage. A MOSFET comprises a plurality of these cells to achieve a desired low channel resistance. The cell regions are formed using self-alignment techniques at several stages of the fabrication process.
Career Highlights
Peter Almren Losee is currently employed at General Electric Company, where he continues to innovate and contribute to advancements in technology. His work has been instrumental in enhancing the efficiency and performance of semiconductor devices.
Collaborations
Throughout his career, Peter has collaborated with notable colleagues, including Stephen Daley Arthur and Kevin Sean Matocha. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Peter Almren Losee is a prominent figure in the field of semiconductor technology, with a focus on MOSFET cell structures. His patent and contributions to General Electric Company highlight his commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.
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